NSC Signature Mono Event (Trade)

NSC Mono Event – Close Contact Confidence for Kiwi Eventers

A monoflap eventing saddle that delivers maximum closeness, feel, and freedom right when it matters most. Ideal for New Zealand eventers tackling the demands of cross country and show jumping, this saddle keeps you connected to your horse without sacrificing support or comfort.

Monoflap construction ensures a direct connection with your horse, while forward cut pre-moulded knee and thigh blocks offer instant lower leg stability over fences. The flatter cantle and ergonomic seat structure promote freedom of movement, especially across varied terrain and technical phases. A medium wide twist gives you a secure yet natural leg position, perfect for long days in the saddle.

The NSC Mono Event works well for horses with flatter to medium curved backs, medium to higher withers, and well sprung ribcages. The innovative girthing system helps keep the saddle stable on rounder or more compact builds.

Crafted with a wooden laminated spring tree and wool flocked panels, this saddle is built for comfort and adjustability. Its design supports shoulder movement, promotes rider balance, and minimises pressure points. A variety of leather, colour, and trim options means you can make it distinctly yours.

Why riders choose the NSC Mono Event

• Monoflap, forward cut flap for optimal close contact feel and a natural leg position
• Pre moulded knee and thigh blocks provide support without restricting movement
• Flatter cantle allows freedom on cross country terrain
• Medium wide twist for comfort and balance
• Wool or rubber panels ensure comfort and pressure relief, with wool bag panels lighter and seam free
• Wooden spring tree provides resilience and flex to support natural movement
• Balanced point of gravity to help promote shoulder and knee flexion
• Innovative girthing system offers stability on rounder builds
• Choice of English Mellow, Italian Calf or Buffalo leather for grip and durability
• Custom colours, piping, crystals and patent details available by request